Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Oluwatobi Adeleke & Sina Karimzadeh & Tien-Chien Jen
ALD Artificial Intelligence Computational Intelligence Materials Processing Modeling Technique thin films
Published: Oct 21, 2023
Description:
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.